Electrochim Acta 2009, 54:5142–5148.Epigenetics CrossRef 14. Asoh H, Fujihara K, Ono S: Triangle pore arrays fabricated on Si (111) substrate by sphere lithography combined with metal-assisted chemical etching and anisotropic chemical etching. Nanoscale Res Lett 2012, 7:406.CrossRef 15. Arai F, Asoh H, Ono S: Electroless deposition of noble metal nano particles as catalyst and subsequent micropatterning of silicon substrate by wet chemical etching. Electrochemistry 2008, 76:187–190.CrossRef 16. Bauer S,

Brunner JG, Crenolanib cell line Jha H, Yasukawa Y, Asoh H, Ono S, Böhm H, Spatz JP, Schmuki P: Ordered nanopore boring in silicon: metal-assisted etching using a self-aligned block copolymer Au nanoparticle template and gravity accelerated etching. Electrochem Commun 2010, 12:565–569.CrossRef 17. Asoh H, Sasaki K, Ono S: Electrochemical etching of silicon through anodic porous alumina. Electrochem Commun 2005, 7:953–956.CrossRef 18. Zacharatos F, Gianneta V, Nassiopoulou AG: Highly ordered hexagonally arranged nanostructures on silicon through a self-assembled silicon-integrated porous anodic alumina masking layer. Nanotechnol 2008, 19:495306.CrossRef

19. Zacharatos F, Gianneta V, Nassiopoulou AG: Highly ordered hexagonally arranged sub-200 nm diameter vertical cylindrical pores on p-type Si using non-lithographic pre-patterning of the Si substrate. Phys Status Solid A 2009, 206:1286–1289.CrossRef 20. Asoh H, Matsuo M, Yoshihama M, Ono S: Transfer of nanoporous pattern of anodic porous alumina into Branched chain aminotransferase Si substrate. Appl Phys Lett 2003, 83:4408–4410.CrossRef 21. Oide A, Asoh BMN 673 manufacturer H, Ono S: Natural lithography of Si surfaces using localized anodization

and subsequent chemical etching. Electrochem Solid-State Lett 2005, 8:G172-G175.CrossRef 22. Asoh H, Oide A, Ono S: Fabrication of self-ordered nanohole arrays on Si by localized anodization and subsequent chemical etching. Appl Surf Sci 2005, 252:1668–1673.CrossRef 23. Thompson GE, Furneaux RC, Wood GC, Richardson JA, Goode JS: Nucleation and growth of porous anodic films on aluminium. Nature 1978, 272:433–435.CrossRef 24. Crouse D, Lo YH, Miller AE, Crouse M: Self-ordered pore structure of anodized aluminum on silicon and pattern transfer. Appl Phys Lett 2000, 76:49–51.CrossRef 25. Chu SZ, Wada K, Inoue S, Todoroki S: Formation and microstructures of anodic alumina films from aluminum sputtered on glass substrate. J Electrochem Soc 2002, 149:B321-B327.CrossRef 26. Ono S, Oide A, Asoh H: Nanopatterning of silicon with use of self-organized porous alumina and colloidal crystals as mask. Electrochim Acta 2007, 52:2898–2904.CrossRef 27. Masuda H, Satoh M: Fabrication of gold nanodot array using anodic porous alumina as an evaporation mask. Jpn J Appl Phys 1996, 35:L126-L129.CrossRef 28. Masuda H, Yamada H, Satoh M, Asoh H, Nakao M, Tamamura T: Highly ordered nanochannel array architecture in anodic alumina. Appl Phys Lett 1997, 71:2770–2772.CrossRef 29.